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Spacer Engineered FinFET Architectures: High-Performance Digital Circuit Applications


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2017 | ISBN: 1498783597 | English | 154 Pages | PDF | 4 MB

This book focusses on the spacer engineering aspects of novel MOS-based device-circuit co-design in sub-20nm technology node, its process complexity, variability, and reliability issues. It comprehensively explores the FinFET/tri-gate architectures with their circuit/SRAM suitability and tolerance to random statistical variations.
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